The Â鶹¹ÙÍø has acquired a state-of-the-art Raith 100 kV EBPG5150Plus system, with high-resolution patterning capability below 5 nm. The system is integrated with a powerful software tool (Beamer, GenISys) to manage electron scattering effects and optimize the designed pattern data effectively. The applications of this technology are diverse, enabling device nanofabrication in areas ranging from electronic, photonic devices, quantum structures to biomedical microdevices, bioMEMS and DNA sensing.
Register below for the Electron Beam Nanolithography Workshop, hosted by COSINC.
Tuesday, June 18. 8:30 a.m.-5 p.m., SEEC S228
Participants will receive a broad overview of the various processes involved in this technology, representing a great preparation to receive training and use the system once installed at CUB. This is a great opportunity to learn about the key technologies, enabling innovations in semiconductor and quantum device fabrication research areas, among others.
Ìý²¹²Ô»åÌý will be on hand for technical questions. A live demonstration will be shared via a remote connection to a system.